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1990 (1)
1Author    Hubert Schmidbaur, Heinz Schuh, ProfRequires cookie*
 Title    Die unterschiedliche Reaktivität von 1,4-Disilabutan und //-Tetrasilan gegenüber sekundären Aminen Differences in Reactivity of 1,4-Disilabutane and //-Tetrasilane towards Secondary Amines  
 Abstract    1,4-Disilabutane H3SiC H 2C H 2S iH 3 (1) and /2-tetrasilane H 3SiSiHUSiH2S iH 3 were employed as model systems for the preparation o f silicon-rich am inosilanes potentially useful for the deposition o f silicon nitride Si3N 4. 1 reacts with the appropriate equivalents o f diethyl-amine in an alkane solvent and in the presence o f the two-phase catalyst N aN H ,/18-crow n-6 to give the products (Et2N)2S iH C fT C H ,S iH 3, (Et2N)2SiH C H 2C H 2S iH 2(N E t2), and (Et2N)^SiHCH,CH1SiH (N E t2)2. By contrast, /z-Si4H 10 undergoes a cleavage reaction under similar conditions to yield H 3S iN E t7 and H 2S i(N E t2) 7 together with a mixture o f polysilanes Si"H7"+2, the com position o f which is depending on the reaction conditions and the nature o f the catalyst (NaH and N a N H 2). Diethylam inopolysilanes are also formed, but only in trace quantities. Treatment o f «-Si4H l0 with pyrrole (C4H 5N) leads to the formation o f trisilane ac­ companied by the pyrrolylsilanes H 1Si(C 4H 4N)^, HSi(C4H4N)3, and Si(C4H4N)4. The differ­ ences in reactivity suggest excellent leaving group properties o f silyl anions in the reaction with amines. 
  Reference    Z. Naturforsch. 45b, 1679—1683 (1990); eingegangen am 8. Juni 1990 
  Published    1990 
  Keywords    Silylamine Reactivity, Polysilylamines, Polysilanes, Silicon Nitride Precursors 
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 TEI-XML for    default:Reihe_B/45/ZNB-1990-45b-1679.pdf 
 Identifier    ZNB-1990-45b-1679 
 Volume    45